Product / Optic & Electronic Materials / Photoresist chemical_Arf photoresist,4-acetoxystyrene,boronic acid
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Photoresist chemical
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Products name CAS NO. Structure Formula
4-Hydroxystyrene,CAS 2628-17-3 2628-17-3 4-Hydroxystyrene,CAS 2628-17-3 C8H8O
alpha-Methacryloxy-gama-butyrolactone,195000-66-9 195000-66-9 alpha-Methacryloxy-gama-butyrolactone,195000-66-9 C8H10O4
4-Acetoxystyrene,CAS 2628-16-2 2628-16-2 4-Acetoxystyrene,CAS 2628-16-2 C10H10O2
Acetoacetic acid 1-isopropylcyclohexyl ester 15780-57-1 Acetoacetic acid 1-isopropylcyclohexyl ester C9H18O
Acrylic acid 1-methylcyclohexyl ester 178889-47-9 Acrylic acid 1-methylcyclohexyl ester C10H16O2
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